1. This year Minton also began to practise lithography.

2. A delicate process of lithography brings out the richness of the bird's colouring on Coalport's finest bone china.

3. Lithography a printing process based on the principle of the natural aversion of water to grease.

4. Lithography had many advantages over the difficult and complicated processes of copper and steel engraving, and even over the woodcut.

5. Litho: Short for Lithography. Also called Offset.

6. Composition rich in imaginative design, lithography wonderful way abnormal.

7. Nano - imprint lithography drum paper teeth spring break.

8. The deflection system of an electron beam lithography tool is used to control deflection scanning of electron beam.

9. Lithography servo disk is a new servo locating technique for magnetic head.

9. is a online sentence dictionary, on which you can find good sentences for a large number of words.

10. Soft lithography and anodic process were combined to prepare the pattern porous alumina successfully.

11. The atomic lithography experiments were carried out by use of a metastable neon atomic beam.

12. This paper introduces the development of electron beam lithography around the world and basic fundamentals of pattern generator.

13. Offset lithography: A modification of the lithography process by an American I. W. Rubul.

14. Nano lithography technology plays a very important role in the field of nano electronic manufacturing, while e beam lithography is one of the best ways to produce nano features.

15. Intel continues to use 193 - nm dry lithography at 45 nm.

16. Compared with other UV or DUV lithography lenses, this lens can meet the needs of higher numerical aperture and full use of its field.

17. As a means of reproducing plates in illustrated texts, lithography had not been in use for even a decade.

18. It was therefore left to Lear to realise the full potential of lithography, and to revolutionise bird illustration in the process.

19. Where the technique of etching fell woefully short, he discovered, the art of lithography excelled.

20. Several chapters cover the basics of clean room technology, e.g., lithography, etching and layer deposition techniques.

21. The device is fabricated in Gallium Arsenide using electron beam lithography to define special side-gated channels.

22. This paper discusses the principle of bottom side alignment system on double-faced lithography, and mainly introduces the application of digital image processing in the system.

23. The aerial image qualities of depth of focus (DOF) and optical proximity effect are simulated with the lithography simulation software PROLITH.

24. Students of graphic communications learn the technical skills needed to work in a variety of production settings, including press, offset lithography, screen printing, digital imaging, and more.

25. An imaging system of pattern generator was designed to correct linear distortion of scanning field of ane-beam lithography system, which was composed of both hardware and software.

26. To improve the fabrication technology of photoelectrical encoder , the laser lithography method was introduced.

27. Laser frequency stabilization derived from Cr atomic beam laser induced fluorescence is a good way to solve excursion of laser frequency in Cr atom lithography.

28. The result shows that the second harmonic light of CVL can be used as an illumination source in submicron lithography.

29. W . B . Young , " Analysis of the nanoimprint lithography with a viscous model ", Microelectronic Engineering, Vol.77 , pp .405 - 411 ( 2005 ).

30. The major techniques are relief printing, intaglio printing, surface printing such as lithography, and stencil printing.

31. A second was to improve printability of feature sizes is to increase the numerical aperture (NA) of the lithographic imaging tool, with water immersion lithography currently being used.

32. A process for printing from a smooth surface, as lithography offset.

33. In popular IC manufactory system, Lithography is the most valuableness and critical process.

34. Electron - beam lithography with a novel multilevel resist structure defines the pattern.

35. Nanoimprint lithography becomes a hot focus of novel lithography technologies of next generation due to its advantages of low cost, high yield and fidelity of large area pattern transfer.

36. Based on the SDS-3 E-beam lithography machine, the electrostatic deflection of the folded plate structure was used instead of the electrostatic deflection of the plate.

37. Nano - imprint lithography drum paper teeth or wear parts.

38. This paper describes the development of phase shifting lithography and its applications in ULSI technology.

39. Thus it is the reasonable basis to put forward extending the waterless lithography printing in China.

40. Nikon and rival ASML Holding NV are going toe-to-toe in lithography, but the two the companies have markedly different strategies.

41. In high numerical aperture and low technic factor lithography process, degradation of the image quality because of the coma aberration in the projection lens has become a serious problem.

42. Compact Plasma Focus (CPF) device (NX2) operating in neon with high performance and high repetition rate is developed and used as an intense Soft X-Ray (SXR) source for microelectronics lithography.

43. This significant advance in lithography provides increased depth of focus and improved image fidelity that can improve chip-level performance and manufacturing efficiency.

44. The experimental results of SDS-3 Ebeam lithography machine show that the aberrations of the electrostatic deflection are in the same order of the magnetic deflection.

45. The principles of LIGA process on mask, X ray lithography, electroform and model were analyzed.

46. Lithography - engraving by expasivity monlchamus in print , on behalf of the surface is a lithograph.

47. The FIR filter used in the power supply of submicron E beam lithography system is described.

48. In the manufacture process of integrated circuit(IC), lithography occupy a very important step, and the quality of photomask used in lithography affects the yield of LSI.

49. A new fabrication method for hollow microneedle array is proposed with three times exposures in deep X-ray lithography of synchrotron radiation and the development procedure.

50. Solution: fine - tune gripper teeth pad with Nano - imprint lithography drum edge.

51. Needle etching, lithography and gravure gravure business card printing belongs to and membership card.

52. The new source function was used to build a new lithography model based on SPLAT.

53. Some industrial applications including micromachining dynodes of photomultipliers, repairing photomask of lithography, fabricating array micro-holes in incandescent filaments, etc. are introduced.

54. A process for printing from a smooth surface, as lithography or offset.

55. Lithography business card printing and membership card to make an indirect business card printing and membership card.

56. Durable , white, water - resistant, low shrinkage resin for stereo lithography for SLA system.

57. In this paper, the present, the existing problem and the prospect for the maskless lithography technology are introduced.

58. Based on lithography technology , the electrochemical lamella machining ( ECLM ) by frequency group pulses was experimentally studied.

59. Lithography - The process used to transfer patterns onto wafers.

60. 'Artist Degrees - Mecca or Manhattan' is a composition of six images which combine painting with a number of serial techniques that are inspired by photogravure and lithography.

61. Blanket in Nano - imprint lithography procedure of periodic alternating stress of deformation.

62. Imprint lithography is a low - cost high - efficiency patterning technique - 100 nm resolution.

63. Course concepts include: concept design. layout. paste-up. and techniques such as engraving. etching. silkscreen. lithography. offset. drawing and cartooning. painting. collage. and computer graphics.

64. Paper in Nano - imprint lithography, mechanical deformation and distortion of process water absorption.

65. E-beam tools are used in photomask writing, but many believe the technology will never be fast enough for high-volume semiconductor lithography.

66. A process of soft lithography was introduced for fabrication of PDMS ( polydimethylsiloxane ) micro - mixer on micro - fluidic chip.

67. The company has Heidelberg Subaru four - color, color, offset lithography, double - sided printing presses, such as printing equipment.

68. Atom hologram lithography employs binary computer generated hologram to handle atoms for making microstructure.

69. Individual sodium titanate nanowire - based device is fabricated via e - beam lithography techniques.

70. Microfabrication of periodic structures by holographic lithography technology combining with visible laser-induce photopolymerization is developed in this paper.

71. The lithography and the manufacture technology are the lithograph most important art performance method.

72. ERS 10 Nano - imprint lithography system test of commercial enterprises.

73. Study on fabrication of silicon-based photon crystal slab with lithography and reactive ion etching is carried out.

73. Wish you will love and make progress everyday!

74. Relief of the basic features available through the concavoconvex Nano - imprint lithography process can be fully expressed.

75. The advantage for the maskless lithography technology be reduce the mask costs.

76. This thesis introduces microsphere lithography ( MSL ) and photoelectrochemical (PEC) etching, and describes how to fabricate sub-micro triangular rods by these methods.

77. Die itsintercalation mounted on the reciprocating motion of the platforms, and nano - imprint lithography cylinder reciprocating contact.

78. The residual surface potential may introduce errors in following observations, affect measurement accuracy in critical dimension SEM and cause pattern placement errors in electron beam lithography.

79. Nanoimprint lithography drum, Nanoimprint lithography platform frequently, maintain its flat,() smooth.

80. This article mainly explains the process of LIGA technology, which includes X - ray lithography, - electroforming and - copy.

81. The proximity effect in the E - beam lithography system was verified by experiments.

82. A microfabrication of periodic structures by holographic lithography technology combined with the visible laser-induced photopolymerization is developed in this paper.

83. The design and fabrication of high aspect-ratio hard X-ray zone plates by X-ray lithography are studied.

84. The room temperature imprint lithography has overcome many difficulties appeared HEL and has high resolution.

85. In this paper, Focused Ion Beam Lithography technology and is introduced.

86. The principle on stereo lithography, laser source , photo curing resin and photo - initiator were reviewed.

87. A novel process combining the self-assembly technique with electron beam lithography and selective chemical deposition was proposed for patterned film preparation.