1. Photoetching polysilicon forms force sensitive resistance bar.

2. When the probe inducing photoetching film is used for probe inducing surface plasma resonance photoetching, the corrosion linewidth is greatly reduced.

3. In addition, 64 serial number by factory photoetching , leave out costly user process designing, can prevent serial number to be distorted.

4. It can be used in microelectronic processing, photoetching and scan microscopic focusing or imaging system.

5. Sucker, photoetching projective apparatus, method for producing sucker and component producing method.

6. In the microfabrication process, photolithography photoetching method and ion-exchanging technology were introduced and investigated for the special glass substrate.

7. Aligning method, aligning substrate, photoetching device and component manufacturing method.

8. Photoetching device, mirror element, device producing method and beam transfering system.

9. Brazing quality and product reliability are both increased as using high frequency pulse microplasma arc heating process for assembly brazing of cathode and photoetching grid of electron tube.

10. In this paper, an optical alignment system is introduced using gratings with different constant for the step projection photoetching machine.

11. In addition, the method is compatible with the matured photoetching process, thereby reducing the cost and being beneficial to industrial production.

12. " but nowadays, need " taste with fine lead the DFM that is a center " ,[ ] pay close attention to craft change and photoetching .

13. Advanced end handles process side, these 4 companies will head 3 plans, back end handles science and technology of photoetching of process, EUV and technology of film of attack by surprise.

14. The present invention belongs to the field of chemical fiber producing technology, and is spinning jet capillary bore machining method based on photoetching.

15. At same time, it has been pointed out that the photoetching technology and printing technology have important application in color PDP display.

16. The exposure system is an important component of the photoetching equipment and its performance is one of the main properties of the equipment.

17. The process of plugging big channel with gel has been observed under microscope by using microsimulation photoetching model.

18. The material of oar shape chemistry that phosphor turns indium chip to call photoetching glue through a kind on product line has package.

19. He points out, optics is approached corrective (OPC) help is ecbolic " new industry of whole " , conduce to ensure " the DFM that is a center with photoetching .