1. The beam division method in maskless laser interference photolithography can be divided into wave-front division and amplitude division.

2. The principle for eliminating the diffraction error of photolithography with lens array is demonstrated by optical transfer function method.

3. In the microfabrication process,() photolithography photoetching method and ion-exchanging technology were introduced and investigated for the special glass substrate.

4. Atom photolithography is a new application of atom optics in microfabrication technical field.

5. With 300 lines of Photolithography and screen resolution, with cyberctm indosinian.

6. Premium Wafer - A wafer that can be used for particle counting, measuring pattern resolution in the photolithography process, and metal contamination monitoring.

7. Defocusing effect on the patterns of microlens array imaging photolithography is analyzed, and tolerance of defocusing range of the system is given.

8. Simulation and experiments show that for point array or hole array patterns with the same sizes maskless interference photolithography is much simple than the traditional photolithography.

9. How to use the measured effective diffusion length and scanner illumination condition to demonstrate photolithography line width uniformity is introduced.

10. The anchor with very deep recess is fabricated utilizing the dry film photolithography technique.

11. The third part is to use the sputtering , photolithography to produce heaters and temperature sensors which heat the reaction micro chamber and provide the temperature condition for the PCR reaction.

12. In Fig . 3 B, avidin protein was printed by photolithography onto a biotinylated PSI surface.

13. Alignment Precision - Displacement of patterns that occurs during the photolithography process.

14. The patterned anodic aluminum oxide ( AAO ) template was fabricated by UV photolithography.