1. The mathematics model that showed photoresist spin coating thickness evolvement on spherical surface was put forward.

2. According to the analysis of the photoresist process that got organic initiator conditions, nanometer of physical map was obtained.

3. Main factors of influencing photoresist thickness for dip coating is analysed in this paper. The thickness of photoresist is determined by it.

4. An optimized UV-LIGA technique, based on SU-8 photoresist process, was successfully applied to manufacture the thick nickel hexagonal micromesh sieve-sheets with high open area.

5. First, holographic interference using a He-Cd (325nm) laser was used to create periodic line structure on an i-line sub-micron positive photoresist film.

6. Therefore, organic pigment must to be fine and symmetrical in the photoresist.

7. No back plate growing method is to electroform metal microstructure on the metal substrate directly by low-cost UV-LIGA technology based on SU-8 photoresist.

8. On the basis of Nickel mould plate fabricated by melting photoresist and electroforming PMMA cylindrical microlens arrays are fabricated by the replication technology of static casting plastic.

9. The flow boards with micro channels were fabricated by photomask alignment and exposure system associated with photoresist coating technique.

10. The rudiments of microneedle actuator have been developed, which is mainly made of SU 8 photoresist, and its 3D construction is fabricated by multistep exposal and electroforming metal.

11. A digital Fourier transform holographic storage system has been developed for data on photoresist plate.

12. The models are based on usual simulation models for chemically amplified photoresist added with swell model and the model for depth- dependent dissolution rate effect.

13. In this study, ozonized water in the single wafer processor was used to study photoresist stripping.

14. We have developed a method to measure the glass transition temperature of photoresist in situ.

15. Is there a documented maximum hold time for panels with laminated photoresist before copper plating.

16. Water also improves the depth of focus —the distances from the camera at which the image projected onto the photoresist stays acceptably sharp.

16. try its best to collect and create good sentences.

17. This paper analyses the blocking voltage, forward voltage drop, photoresist mask design and gate-triggering and dynamic characteristics of high-power thyristors.

18. This paper describes the maskless wiring formation technology not using photomask and photoresist, development of metal nano particle and nano ink, application of the inkjet method and future theme.